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7.2.3 Slip Boundary Formulation for Low-Pressure Gas Systems

Most semiconductor fabrication devices operate far below atmospheric pressure, typically only a few millitorrs. At such low pressures, the fluid flow is in the slip regime and the normally used no-slip boundary conditions for velocity and temperature are no longer valid.

The Knudsen number , denoted Kn, and defined as the ratio of mean free path to a characteristic length scale of the system, is used to quantify continuum flow regimes. Since the mean free path increases as the pressure is lowered, the high end of Kn values represents free molecular flow and the low end the continuum regime. The range in between these two extremes is called the slip regime ( $0.01 < {\rm Kn} <0.1$) [ 28] In the slip regime, the gas-phase velocity at a solid surface differs from the velocity at which the wall moves, and the gas temperature at the surface differs from the wall temperature. Maxwell's models are adopted for these physical phenomena in ANSYS FLUENT for their simplicity and effectiveness.

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The low-pressure slip boundary formulation is available only with the pressure-based solver.


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